P503 – 2″ UHV sputter deposition TU Darmstadt
Application
UHV sputter deposition system for thin film and multilayer deposition at 2″ substrates
Year of delivery
2023
Installation site
TU Darmstadt, Germany
Design Features
- UHV magnetron sputter deposition system with combination of confocal and face to face sputter up configurations.
- Up to eight 2″ magnetrons in confocal configuration and up to one 3″ magnetrons in face to face configuration.
- 2″ magnetrons with pneumatic in situ tilting.
- 3″ magnetron with pneumatic in situ translation
- All 2″ magnetrons with easy changeable magnetic system for use with ferromagentic or non-ferromagnetic target materials.
- Low pressure and low power sputtering possible.
- Fully motorized 2 axes sample manipulator with integrated pneumatic sample shutter and maximal sample temperature well above 700°C.
- Integrated bake out system.
- Load lock chamber with storage.
Special Features
- Very small sample to target distance possible (less than 20mm for 3″ magnetrons).
- System is prepared to be added to a cluster tool via second transfer port at loadlock chamber.
- Different sample sizes from 2″ wafer down to 10mm x 10mm samples can be handled (using different kind of sample adapters).
Outer Dimensions
Technical specifications and performance values
General
Sputtering chamber
Size
600 mm diameter, about 700 mm height
Material
stainless steel
Load lock chamber
Size
200 mm diameter, about 350 mm height
Material
stainless steel
Vacuum
Sputtering chamber
Base pressure
< 1 * 10-8 mbar
Pump down time
1 hour to < 10-7 mbar
Chamber pumping
Turbo pumping stage, chamber lid differentially pumped by dry foreline pump
Bake out
< 150°C
Load lock chamber
Base pressure
< 10-7 mbar
Pump down time
1 hour to < 10-7 mbar
Chamber pumping
Turbo pumping stage with dry foreline pump
Manipulator features
Sputtering chamber
Sample size
diameter max. 2″ substrate
Motion axes
2 motorized axes (manipulator z tranlsation and (continous) sample stage rotation)
Pneumatic sample shutter (part of the manipulator head)
Temperatures
Room temperature (not stabilized) up to 1000°C at sample (short time heating) / > 700°C at sample (long time heating)
Load lock chamber
(Sample storage)
Storage size
6 sample holders
Sample size
diameter max. 2″ substrate
Motion axes
2 manual axes (rotation, z tranlsation)
Rotation axis equipped with an air side scale plate for easy and fast sample loading via access door or one out of two transfer rods
Performance test results
Chamber pump down
Long time sample heating
